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PHOTRONICS INC

Overview
  • Total Patents
    90
  • GoodIP Patent Rank
    180,768
About

PHOTRONICS INC has a total of 90 patent applications. Its first patent ever was published in 1998. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Taiwan. Its main competitors in its focus markets optics, it methods for management and computer technology are NUMERICAL TECH INC, ASML MASKTOOLS BV and PERKIN ELMER CENSOR.

Patent filings per year

Chart showing PHOTRONICS INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Progler Christopher J 22
#2 Croke Charles E 11
#3 Suttile Edward J 10
#4 Cangemi Michael 8
#5 Lassiter Matthew 8
#6 Eynon Ben 7
#7 Unruh James Owen 6
#8 Rhyins Peter 6
#9 Cahalane Daniel J 6
#10 Xiao Guangming 5

Latest patents

Publication Filing date Title
US2020081337A1 Pellicle for flat panel display photomask
US2018307133A1 Pellicle removal tool
US2014204450A1 Microfluidic thermoptic energy processor
US2014272688A1 Grayscale lithography of photo definable glass
US2014146636A1 Mixer chip
US2008261127A1 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
US2008261126A1 Secure photomask with blocking aperture
US2008261123A1 Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
EA009013B1 Comprehensive front end method and system for automatically generating and processing photomask orders
KR20080018211A System and method for automatically generating and/or processing a photomask order using a script profiler
US2005278046A1 Comprehensive front end method and system for automatically generating and processing photomask orders
EA008878B1 Rule based system and method for automatically generating photomask orders
CN101023428A Rule based system and method for automatically generating photomask orders
KR20070093096A System and method for automatically generating a tooling specification using a logical operations utility that can be used to generate a phtomask order
US7640529B2 User-friendly rule-based system and method for automatically generating photomask orders
WO2005036264A2 Photomask having an internal substantially transparent etch stop layer
US2005277033A1 Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases
US7669167B2 Rule based system and method for automatically generating photomask orders by conditioning information from a customer's computer system
US2005277032A1 Photomask reticle having multiple versions of the same mask pattern with different biases
US2005208390A1 Embedded attenuated phase shift mask with tunable transmission