| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Germany | 6 | |
| #2 | EPO (European Patent Office) | 5 | |
| #3 | WIPO (World Intellectual Property Organization) | 5 | |
| #4 | United States | 4 | |
| #5 | China | 2 | |
| #6 | Republic of Korea | 1 | |
| #7 | Taiwan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Optical systems |
| # | Name | Total Patents |
|---|---|---|
| #1 | Opower Hans | 21 |
| #2 | Scharl Stefan | 15 |
| #3 | Juenger Klaus | 4 |
| #4 | Leinenbach Dirk | 4 |
| #5 | Opower Hans Prof Dr | 1 |
| #6 | Anders-Woschick Markus | 1 |
| #7 | Hans Opower | 1 |
| #8 | Stefan Scharl | 1 |
| #9 | Scharl Stefan Dipl-Ing | 1 |
| #10 | Göhnermeier Aksel | 1 |
| Publication | Filing date | Title |
|---|---|---|
| DE102012108211A1 | exposure system | |
| EP2054772A2 | Exposure apparatus | |
| DE102006008075A1 | exposure system | |
| DE10346201A1 | Lithography illumination device uses focussing optic with end lens producing focal points of light irradiation from each laser beam source close to light-sensitive layer | |
| DE10242142A1 | Method and device for producing exposed structures | |
| DE10212344A1 | Device for exposing substrate materials | |
| DE10160917A1 | Lithography exposure device |