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ASM LITHOGRAPHY BV

Overview
  • Total Patents
    246
About

ASM LITHOGRAPHY BV has a total of 246 patent applications. Its first patent ever was published in 1986. It filed its patents most often in Japan, Republic of Korea and Taiwan. Its main competitors in its focus markets optics, mechanical elements and machines are ELECTROMASK INC, KLEO HALBLEITERTECHNIK GMBH and CHIME BALL TECHNOLOGY CO LTD.

Patent filings per year

Chart showing ASM LITHOGRAPHY BVs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Loopstra Erik Roelof 32
#2 Kwan Yim Bun Patrick 25
#3 Straaijer Alexander 15
#4 Banine Vadim Yevgenyevich 13
#5 Bisschops Theodorus Hubertus J 11
#6 Van Den Brink Marinus Aart 10
#7 Loopstra Erik R 10
#8 Bleeker Arno Jan 9
#9 Vijfvinkel Jakob 9
#10 Van Der Laan Hans 9

Latest patents

Publication Filing date Title
EP1184727A1 Lithographic apparatus
TW548524B Lithographic projection apparatus, device manufacturing method and device manufactured thereby
JP2002124463A Mask handler, plate projector, method for fabricating element and element fabricated by that method
TW497013B Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method
EP1178357A1 Lithographic apparatus
JP2002090979A Auxiliary figure used for lithographic projection
AU8048501A A method of illuminating a photomask using chevron illumination
JP2002110538A Lithographic projector, method for manufacturing device, device manufactured thereby and gas composition
TW498408B Lithographic apparatus, device manufacturing method, and device manufactured thereby
TW500987B Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby
JP2002008974A Projection lithography system, method of determining position of alignment mark of substrate, method of manufacturing apparatus, and device manufactured by the method
EP1248148A1 Lithographic patterning means with protective layer
EP1243969A1 Lithographic projection apparatus and positioning system
JP2001284440A Substrate holder of lithography apparatus
EP1233304A1 Lithographic apparatus
EP1231514A1 Measurement of wavefront aberrations in a lithographic projection apparatus
EP1231513A1 Lithographic projection apparatus with adjustable focal surface
TW490598B Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
US6388736B1 Imaging method using phase boundary masking with modified illumination
TW479157B Mask for use in a lithographic projection apparatus and method of making the same