JP2005092432A
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Accounting program and system
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CN1484281A
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When printing the tight quarters adjacent, adopt second exposure to assist the PSM exposure with big feature
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Programmable aperture for lithographic imaging systems
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Method and apparatus for creating a phase-shifting mask for a photolithographic process
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Verification utilizing instance-based hierarchy management
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Method and apparatus for using a complementary mask to clear phase conflicts on a phase shifting mask
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Performing optical proximity correction on trim-level segments not abutting features to be printed
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Phase shifting mask topography effect correction based on near-field image properties
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Accelerated layout processing using OPC pre-processing
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Phase shift mask including sub-resolution assist features for isolated spaces
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Hybrid optical proximity correction for alternating aperture phase shifting designs
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Phase shift mask layout process for patterns including intersecting line segments
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Considering mask writer properties during the optical proximity correction process
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Method and apparatus for reducing optical proximity correction output file size
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Model-based data conversion
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Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process
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Method and apparatus for facilitating process-compliant layout optimization
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Method and apparatus to facilitate test pattern design for model calibration and proximity correction
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Automated flow in PSM phase assignment
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Facilitating an adjustable level of phase shifting during an optical lithography process for manufacturing an integrated circuit
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