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NUMERICAL TECH INC

Overview
  • Total Patents
    139
About

NUMERICAL TECH INC has a total of 139 patent applications. Its first patent ever was published in 1997. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Australia. Its main competitors in its focus markets optics, computer technology and machines are ASML MASKTOOLS BV, LUMINESCENT TECHNOLOGIES INC and HEFEI CHIP FOUND MICRO ELECTRONICS EQUIPMENT CO LTD.

Patent filings in countries

World map showing NUMERICAL TECH INCs patent filings in countries

Patent filings per year

Chart showing NUMERICAL TECH INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Pierrat Christophe 65
#2 Wang Yao-Ting 33
#3 Chang Fang-Cheng 26
#4 Pati Yagyensh C 19
#5 Liu Hua-Yu 14
#6 Cote Michel Luc 14
#7 Zhang Youping 12
#8 Wu Shao-Po 10
#9 Christophe Pierrat 5
#10 Cho Seonghun 5

Latest patents

Publication Filing date Title
JP2005092432A Accounting program and system
CN1484281A When printing the tight quarters adjacent, adopt second exposure to assist the PSM exposure with big feature
US2004197672A1 Programmable aperture for lithographic imaging systems
US2004128642A1 Method and apparatus for creating a phase-shifting mask for a photolithographic process
US2003088837A1 Verification utilizing instance-based hierarchy management
US2004076892A1 Method and apparatus for using a complementary mask to clear phase conflicts on a phase shifting mask
US2004076891A1 Performing optical proximity correction on trim-level segments not abutting features to be printed
US2004073884A1 Phase shifting mask topography effect correction based on near-field image properties
US2004060034A1 Accelerated layout processing using OPC pre-processing
US2003013024A1 Phase shift mask including sub-resolution assist features for isolated spaces
US2004049761A1 Hybrid optical proximity correction for alternating aperture phase shifting designs
US2003008222A1 Phase shift mask layout process for patterns including intersecting line segments
US2004044984A1 Considering mask writer properties during the optical proximity correction process
US2004006756A1 Method and apparatus for reducing optical proximity correction output file size
US2003229879A1 Model-based data conversion
US2003190762A1 Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process
US2003192013A1 Method and apparatus for facilitating process-compliant layout optimization
US2003192015A1 Method and apparatus to facilitate test pattern design for model calibration and proximity correction
US2003192025A1 Automated flow in PSM phase assignment
US6605481B1 Facilitating an adjustable level of phase shifting during an optical lithography process for manufacturing an integrated circuit