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LUMINESCENT TECHNOLOGIES INC

Overview
  • Total Patents
    36
  • GoodIP Patent Rank
    240,930
About

LUMINESCENT TECHNOLOGIES INC has a total of 36 patent applications. Its first patent ever was published in 2003. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets optics, computer technology and environmental technology are NUMERICAL TECH INC, INVARIUM INC and ASML MASKTOOLS BV.

Patent filings per year

Chart showing LUMINESCENT TECHNOLOGIES INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Peng Danping 21
#2 Osher Stanley 15
#3 Abrams Daniel S 14
#4 Abrams Daniel 14
#5 Ashton Christopher James 4
#6 Liu Yong 4
#7 Cecil Thomas C 3
#8 Pang Linyong 3
#9 Irby David 2
#10 Rissman Paul 1

Latest patents

Publication Filing date Title
WO2014159453A1 Technique for repairing an euv photo-mask
US2012137260A1 Virtual photo-mask critical-dimension measurement
WO2011011112A1 Determining source patterns for use in photolithography
US2009075183A1 Technique for determining mask patterns and write patterns
US2009013304A1 Physical-resist model using fast sweeping
US2007186206A1 System, masks, and methods for photomasks optimized with approximate and accurate merit functions
WO2007044827A2 Fast systems and methods for calculating electromagnetic fields near photomasks
US2007196742A1 Mask-patterns including intentional breaks
US2007186208A1 Mask-pattern determination using topology types
WO2007041602A2 Lithography verification using guard bands
TW200731001A Systems, masks, and methods for photolithography
TW200639590A Systems, masks and methods for printing contact holes and other patterns
US2007009808A1 Systems, masks, and methods for manufacturable masks using a functional representation of polygon pattern
US7124394B1 Method for time-evolving rectilinear contours representing photo masks
US2007011644A1 Optimized photomasks for photolithography