| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 5 | |
| #2 | EPO (European Patent Office) | 4 | |
| #3 | Japan | 3 |
| # | Industry | |
|---|---|---|
| #1 | Optics |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Optical systems |
| # | Name | Total Patents |
|---|---|---|
| #1 | Mayer Herbert E | 4 |
| #2 | Tabarelli Werner | 4 |
| #3 | Loebach Ernst | 3 |
| #4 | Loebach Ernst W | 2 |
| #5 | Erunsuto Reebatsuha | 1 |
| #6 | Heruberuto Ee Maiyaa | 1 |
| #7 | Mayer Herbert | 1 |
| #8 | Erunsuto Buee Reebatsuha | 1 |
| Publication | Filing date | Title |
|---|---|---|
| JPS6465837A | Exposure lighting equipment | |
| EP0302130A1 | Illumination device | |
| EP0302124A1 | Apparatus for projection copying from masks onto a substrate | |
| EP0297161A1 | Projection exposure system | |
| US4592648A | Device for projection copying of masks onto a workpiece |