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OCG MICROELECTRONIC MATERIALS

Overview
  • Total Patents
    103
About

OCG MICROELECTRONIC MATERIALS has a total of 103 patent applications. Its first patent ever was published in 1989. It filed its patents most often in United States, EPO (European Patent Office) and Canada. Its main competitors in its focus markets optics, macromolecular chemistry and polymers and organic fine chemistry are OCG MICROELECTRONICS INC, ICHIMURA KUNIHIRO and SUZHOU RUIHONG ELECTRONIC CHEMICALS CO LTD.

Patent filings per year

Chart showing OCG MICROELECTRONIC MATERIALSs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Honda Kenji 25
#2 Toukhy Medhat A 22
#3 Jeffries Iii Alfred T 16
#4 Blakeney Andrew J 14
#5 Tadros Sobhy 11
#6 Sarubbi Thomas R 10
#7 Sizensky Joseph J 9
#8 Brzozowy David J 6
#9 Ferreira Lawrence 6
#10 Muenzel Norbert 5

Latest patents

Publication Filing date Title
EP0727711A2 Photoresist compositions containing supercritical fluid fractionated polymeric binder resins
US5648324A Photoresist stripping composition
EP0723201A1 Phenolic-resins with acid-labile protecting groups
EP0718315A1 Process for the preparation of partially protected phenolic resins
EP0717319A1 Photoacid generating composition used in radiation-sensitive compositions
EP0709410A2 Polymers
US5597678A Non-corrosive photoresist stripper composition
US5507978A Novolak containing photoresist stripper composition
US5545353A Non-corrosive photoresist stripper composition
US5561105A Chelating reagent containing photoresist stripper composition
EP0737897A1 Wet developable etch resistant photoresist for UV-exposure at wavelength below 200 nm
US5541033A Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions
US5462207A Environmentally safe dispensing assembly for ultra-pure liquid chemicals
US5550004A Chemically amplified radiation-sensitive composition
EP0624826A1 Method of forming relief patterns by i-line light irradiation
US5472830A Non-corrosion photoresist stripping composition
EP0601974A1 Positive photoresist with better properties
EP0599779A1 High-resolution negative photoresist having extended processing latitude
US5316884A Radiation-sensitive compositions containing 5-indanol in the binder resin as a comonomer
US5413894A High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions