EP0727711A2
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Photoresist compositions containing supercritical fluid fractionated polymeric binder resins
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Photoresist stripping composition
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EP0723201A1
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Phenolic-resins with acid-labile protecting groups
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EP0718315A1
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Process for the preparation of partially protected phenolic resins
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EP0717319A1
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Photoacid generating composition used in radiation-sensitive compositions
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EP0709410A2
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Polymers
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Non-corrosive photoresist stripper composition
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Novolak containing photoresist stripper composition
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Non-corrosive photoresist stripper composition
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Chelating reagent containing photoresist stripper composition
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EP0737897A1
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Wet developable etch resistant photoresist for UV-exposure at wavelength below 200 nm
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Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions
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Environmentally safe dispensing assembly for ultra-pure liquid chemicals
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Chemically amplified radiation-sensitive composition
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EP0624826A1
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Method of forming relief patterns by i-line light irradiation
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Non-corrosion photoresist stripping composition
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EP0601974A1
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Positive photoresist with better properties
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EP0599779A1
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High-resolution negative photoresist having extended processing latitude
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Radiation-sensitive compositions containing 5-indanol in the binder resin as a comonomer
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High ortho-ortho bonded novolak binder resins and their use in radiation-sensitive compositions
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