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SUZHOU RUIHONG ELECTRONIC CHEMICAL CO LTD

Overview
  • Total Patents
    20
  • GoodIP Patent Rank
    95,280
About

SUZHOU RUIHONG ELECTRONIC CHEMICAL CO LTD has a total of 20 patent applications. Its first patent ever was published in 2010. It filed its patents most often in China. Its main competitors in its focus markets optics, macromolecular chemistry and polymers and organic fine chemistry are HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD, OGIHARA TSUTOMU and ADMS TECH CO LTD.

Patent filings in countries

World map showing SUZHOU RUIHONG ELECTRONIC CHEMICAL CO LTDs patent filings in countries
# Country Total Patents
#1 China 20

Patent filings per year

Chart showing SUZHOU RUIHONG ELECTRONIC CHEMICAL CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Liu Jingcheng 8
#2 Mu Qidao 8
#3 Liu Xiaoya 8
#4 Liu Ren 7
#5 Zheng Xiangfei 6
#6 Bian Yugui 5
#7 Li Hu 5
#8 Ji Changwei 4
#9 Sun Xiaoxia 4
#10 Xu Liang 3

Latest patents

Publication Filing date Title
CN105607417A Coumarin-based sulphonate photo-acid generator and preparation method therefor
CN105713112A Cyclodextrin molecular glass protected by tBOC and photoresist composition composed of cyclodextrin molecular glass
CN105589303A High-capacity developing solution composition for thick film photoresists
CN105467764A Process for improving negative photoresist storage stability of cyclized isoprene system
CN105607416A Molecular glass photoresist composition employing cyclotriphosphazene as structural framework
CN105585847A Positive-working PSPI (photosensitive polyimide) composition with low CTE (coefficient of thermal expansion) and high resolution
CN105607418A High heat-resistant photoresist composition and application technology thereof
CN105759573A Stripping liquid combination for removing residual photoresist after titanium nickel silver surface etching
CN105237669A Preparation of 248 nm deep ultraviolet photoresist film forming resin based on RAFT polymerization method
CN104614954A Photoresist-removing water-based stripping liquid composition
CN104614939A Negative photoresist composition for being mixed with glass powder in GPP process
CN104617302A High-power lithium ion battery anode binder combination and manufacturing method thereof
CN104614941A High-heat resistance chemically-amplified photoresist resin and photoresist combination using same
CN104614942A Ultraviolet positive photoresist and high heat resistance film forming resin thereof
CN104965389A FPD/TP positive photoresist used for flexible substrate
CN105884949A Photoresist composition with branched photosensitive polystyrene-maleic anhydride as matrix resin
CN104193944A Controllable-acid-value photosensitive alkali-soluble polyurethane acrylate resin and photoresist composition thereof
CN104017128A Alkaline-soluble photosensitive resin prepared by use of maleic anhydride ring-opening modified branched oligomer and photoresist composition of resin
CN103848930A Synthesis of N-phenyl maleimide-containing photosensitive acrylic resin and application thereof in negative photoresist
CN102540776A Stripping liquid for removing residual photoresist in semiconductor technology