| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 17 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Semiconductors | |
| #3 | Macromolecular chemistry and polymers | |
| #4 | Basic materials chemistry | |
| #5 | Civil engineering | |
| #6 | Machine tools | |
| #7 | Machines |
| # | Name | Total Patents |
|---|---|---|
| #1 | Kazumasa Wakiya | 2 |
| #2 | Atsushi Nakamura Akihiko Miyan | 1 |
| #3 | Tousiwa Tachikawa | 1 |
| #4 | Kazumasa Yokoi Shigeshi Wakiya | 1 |
| #5 | Fumitapei Kanapo | 1 |
| #6 | Shigeshi Yokoi | 1 |
| #7 | Ryuma Suisawa | 1 |
| #8 | Yasuhide Kubo Atsuko Ouyuchi | 1 |
| #9 | Shoki Sugata | 1 |
| #10 | Shinkichi Asai | 1 |
| Publication | Filing date | Title |
|---|---|---|
| CN1428659A | Stripping liquid for photoresist and photoresist stripping method using said stripping liguid |