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SUZHOU RUIHONG ELECTRONIC CHEMICALS CO LTD

Overview
  • Total Patents
    14
  • GoodIP Patent Rank
    124,273
  • Filing trend
    ⇩ 100.0%
About

SUZHOU RUIHONG ELECTRONIC CHEMICALS CO LTD has a total of 14 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2015. It filed its patents most often in China. Its main competitors in its focus markets optics, organic fine chemistry and macromolecular chemistry and polymers are ICHIMURA KUNIHIRO, Heraeus Precious Metals North America Daychem LLC and OCG MICROELECTRONIC MATERIALS.

Patent filings in countries

World map showing SUZHOU RUIHONG ELECTRONIC CHEMICALS CO LTDs patent filings in countries
# Country Total Patents
#1 China 14

Patent filings per year

Chart showing SUZHOU RUIHONG ELECTRONIC CHEMICALS CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Xu Liang 7
#2 Zheng Xiangfei 7
#3 Ji Changwei 7
#4 Ma Ji 3
#5 Ji Changbin 3
#6 Mu Qidao 2
#7 Huang Wei 2
#8 Bian Yugui 2
#9 Sun Xiaoxia 1

Latest patents

Publication Filing date Title
CN111302979A Single-component molecular glass and preparation method and application thereof
CN111154053A High-heat-resistance carboxyl phenolic resin and synthetic method thereof
CN111123649A Negative photoresist composition containing high-heat-resistance carboxyl phenolic resin
CN111176073A Thick film photoresist composition containing high-heat-resistance carboxyl phenolic resin
CN110824843A High-coating-uniformity negative photoresist composition for mesa device
CN110231754A A kind of more official's photo-acid generators of heterocycle and preparation method thereof and chemical amplification type photoresist obtained
CN110256655A A kind of tannic acid Quito official's epoxy resin and preparation method thereof and preparation can liquid alkali developing negative photoresist
CN107870513A The compound method of negative photoresist, suspension and the suspension
CN107728427A Positive photoresist
CN107759715A Epoxy acrylic resin that succinimide is modified and preparation method thereof, negative photo glue composition
CN107561862A Suitable for the negative photoresist of GPP diodes manufacture
CN107325218A A kind of fluorostyrenic monomers, fluorinated copolymer and the application in 248nm deep ultraviolet light-sensitive lacquers
CN104656375A High-light-sensitivity photoresist composition taking melamine and anacardol modified phenolic resin as matrix
CN104656373A Photosensitizer-free photoresist composition used in glass passivated rectifier chip (GPRC) technology