| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Republic of Korea | 5 | |
| #2 | China | 4 | |
| #3 | Taiwan | 4 | |
| #4 | United States | 4 | |
| #5 | WIPO (World Intellectual Property Organization) | 4 | |
| #6 | EPO (European Patent Office) | 2 |
| # | Industry | |
|---|---|---|
| #1 | Organic fine chemistry | |
| #2 | Optics | |
| #3 | Macromolecular chemistry and polymers | |
| #4 | Basic materials chemistry |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Heterocyclic compounds | |
| #3 | Acyclic or carbocyclic compounds | |
| #4 | Pigments | |
| #5 | Compounding ingredients |
| # | Name | Total Patents |
|---|---|---|
| #1 | Zhang Yongqiang | 22 |
| #2 | Sharma Ram B | 21 |
| #3 | Greene Daniel | 12 |
| #4 | Gupta Rakesh | 6 |
| #5 | Stuck Rachael | 6 |
| #6 | Fogle Jeffrey D | 6 |
| #7 | Kunz Martin | 5 |
| #8 | Campo Darin | 4 |
| #9 | Cho Hyun Yong | 1 |
| #10 | Lee Yeong Beom | 1 |
| Publication | Filing date | Title |
|---|---|---|
| TW201940465A | Cyclic sulfonate compounds as photoacid generators in resist applications | |
| KR20180041201A | In the resist application, a sulfonic acid derivative compound | |
| EP3182203A1 | A combination of nit derivatives with sensitizers | |
| US2016266487A1 | Sulfonic acid derivative compounds as photoacid generators in resist applications | |
| US2016085148A1 | Sulfonic acid derivative compounds as photoacid generators in resist applications |