| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Japan | 29 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Macromolecular chemistry and polymers | |
| #3 | Machines | |
| #4 | Organic fine chemistry | |
| #5 | Basic materials chemistry |
| # | Name | Total Patents |
|---|---|---|
| #1 | Kenji Honda | 10 |
| #2 | Noruberuto Miyuntsueru | 6 |
| #3 | Hansuutoomasu Shiyahato | 5 |
| #4 | Kaaruuroorentsu Merutesudorufu | 5 |
| #5 | Medohatsuto Ei Touukii | 4 |
| #6 | Pasukuaare Arufuredo Fuaruchii | 4 |
| #7 | Rorensu Fuereira | 3 |
| #8 | Arufuretsudo Teii Jiefuriizu Z | 3 |
| #9 | Noruberuto Muentsueru | 2 |
| #10 | Haintsu Horutsubuaruto | 2 |
| Publication | Filing date | Title |
|---|---|---|
| JPH08286376A | Photoresist composition | |
| JPH05234877A | Method for removing metallic impurities from resist component | |
| JPH05234876A | Method for removing metal impurity from resist component |