NEST CORP has a total of 17 patent applications. Its first patent ever was published in 2007. It filed its patents most often in Republic of Korea, WIPO (World Intellectual Property Organization) and United States. Its main competitors in its focus markets semiconductors, electrical machinery and energy and chemical engineering are NIHON SHINKOSHINGI CO LTD, THINKON NEW TECH JAPAN CORPORATION and ADAPTIVE PLASMA TECH CORP.
# | Country | Total Patents | |
---|---|---|---|
#1 | Republic of Korea | 8 | |
#2 | WIPO (World Intellectual Property Organization) | 8 | |
#3 | United States | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Electrical machinery and energy | |
#3 | Chemical engineering | |
#4 | Materials and metallurgy | |
#5 | Micro-structure and nano-technology | |
#6 | Optics |
# | Name | Total Patents |
---|---|---|
#1 | Kim Young | 15 |
#2 | Hong Soonil | 2 |
Publication | Filing date | Title |
---|---|---|
KR20110121484A | Method and apparatus for manufacturing nono-sized silicon powder | |
KR20090129818A | Plasma source | |
WO2008140248A1 | Method for removing photoresist and contaminants | |
KR20090073404A | Method for controlling plasma density distribution in plasma chamber | |
KR20080111743A | Etching method for next generation semiconductor process | |
KR20080102615A | Method and apparatus for multi-mode plasma generation | |
KR20080100625A | Gap-fill method for semiconductor device | |
KR20080100626A | Reverse gap-fill method for semiconductor device | |
KR20080100617A | Hybridly coupled plasma source and plasma chamber using the same |