| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 8 | |
| #2 | Republic of Korea | 2 | |
| #3 | Philippines | 2 | |
| #4 | Singapore | 2 | |
| #5 | WIPO (World Intellectual Property Organization) | 2 | |
| #6 | China | 1 | |
| #7 | EPO (European Patent Office) | 1 | |
| #8 | Taiwan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Chemical engineering | |
| #3 | Surface technology and coating |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Drying solid materials by removing liquid | |
| #3 | Cleaning | |
| #4 | Metallic material removal |
| # | Name | Total Patents |
|---|---|---|
| #1 | Tice Scott | 17 |
| #2 | Wagner Jeffrey M | 2 |
| #3 | Gibbel David S | 2 |
| Publication | Filing date | Title |
|---|---|---|
| US2016265846A1 | Wafer dryer apparatus and method | |
| US2015197861A1 | Metal etch system | |
| US2014273500A1 | Metal liftoff tools and methods | |
| WO2012074587A1 | Liquid coalescence and vacuum dryer system and method |