| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 4 | |
| #2 | China | 3 | |
| #3 | EPO (European Patent Office) | 3 | |
| #4 | Republic of Korea | 3 | |
| #5 | Singapore | 3 | |
| #6 | Taiwan | 3 | |
| #7 | WIPO (World Intellectual Property Organization) | 3 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Chemical engineering | |
| #3 | Machines |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Cleaning | |
| #3 | Spraying devices |
| # | Name | Total Patents |
|---|---|---|
| #1 | Randhawa Rubinder S | 22 |
| #2 | Christov Harry | 21 |
| Publication | Filing date | Title |
|---|---|---|
| US2019054508A1 | Cleaning flat objects with a pulsed-liquid jet | |
| TW201842609A | Removal of process effluents | |
| WO2018145001A1 | Subnanometer-level light-based substrate cleaning mechanism | |
| CN110622290A | Sub-nanometer substrate cleaning mechanism |