| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 8 | |
| #2 | Republic of Korea | 8 | |
| #3 | WIPO (World Intellectual Property Organization) | 5 | |
| #4 | United States | 3 | |
| #5 | Brazil | 2 | |
| #6 | EPO (European Patent Office) | 2 |
| # | Industry | |
|---|---|---|
| #1 | Surface technology and coating | |
| #2 | Machines | |
| #3 | Semiconductors | |
| #4 | Electrical machinery and energy |
| # | Technology | |
|---|---|---|
| #1 | Coating metallic material | |
| #2 | Unspecified technologies | |
| #3 | Semiconductor devices | |
| #4 | Electric discharge tubes |
| # | Name | Total Patents |
|---|---|---|
| #1 | Dickey Eric R | 28 |
| #2 | Barrow William A | 11 |
| #3 | Danforth Bryan Larson | 5 |
| #4 | Barrow William | 2 |
| #5 | William Barrow | 1 |
| #6 | Kon Masato | 1 |
| Publication | Filing date | Title |
|---|---|---|
| CN105143501A | Mixed metal-silicon-oxide barriers | |
| CN102639749A | Inhibiting excess precursor transport between separate precursor zones in an atomic layer deposition system | |
| KR20110100618A | High rate deposition of thin films with improved barrier layer properties | |
| WO2008100963A1 | Fabrication of composite materials using atomic layer deposition | |
| CN101406108A | Atomic layer deposition system and method for coating flexible substrates |