ANERUBA KK innovation strategy

Patent filings in countries

#	Industry
#1	Surface technology and coating
#2	Electrical machinery and energy
#3	Semiconductors
#4	Machines
#5	Optics
#6	Basic materials chemistry
#7	Chemical engineering
#8	Packaging and shipping

#	Technology
#1	Coating metallic material
#2	Electric discharge tubes
#3	Semiconductor devices
#4	Unspecified technologies
#5	Nonlinear optics
#6	Unspecified technologies
#7	Electric machines not otherwise provided for
#8	Transport or storage devices
#9	Plasma technique
#10	Materials for miscellaneous applications

Publication	Filing date	Title
TW336291B	1997-11-14	Non-contact magneto-pneumatic carrier positioning controller
JPH08232063A	1996-03-08	Sputtering device
JPH08250577A	1995-03-10	Planetary type wafer holder
JPH08240503A	1995-03-06	Flange mount-type hot cathode ionization vacuum gauge
JPH08241865A	1995-03-03	Plasma cvd device and in-situ cleaning after-treating method
JPH08228433A	1995-02-22	High-voltage power source and shield potential detecting circuit
JPH08226512A	1995-02-17	Non-contact type magnetic guidance feeding device
JPH08199354A	1995-01-30	Sputtering cathode
JPH08203881A	1995-01-30	Surface treatment system
JPH08203695A	1995-01-24	Plasma treatment device
JPH08193271A	1995-01-13	Preliminary treatment completion point detector after on-the-spot cleaning treatment and completion point detection
JPH08190091A	1995-01-11	Thin film substrate for liquid crystal display, liquid crystal display using the thin film substrate and producing device for thin film substrate of liquid crystal display
JPH08170171A	1994-12-17	Formation of ito transparent conductive film
JPH08153712A	1994-11-29	Plasma treatment method
JPH08138888A	1994-11-16	Plasma treatment apparatus
JPH08148472A	1994-11-15	Plasma processing device
JPH08144058A	1994-11-15	Magnetron sputtering and device therefor
JPH08145835A	1994-11-15	Helium leak detector for sniffer
JPH08134640A	1994-11-12	Magnetron cathode electrode of sputtering device
JPH08106996A	1994-09-30	Plasma processing device