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Multi-Step Atomic Layer Deposition Process for Silicon Nitride Film Formation
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Atomic Layer Deposition Method Using Source Precursor Transformed by Hydrogen Radical Exposure
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Deposition device with auxiliary injectors for injecting nucleophile gas and separation gas
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Atomic Layer Deposition Using Injector Module Arrays
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Cleaning of deposition device by injecting cleaning gas into deposition device
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Deposition of non-isostructural layers for flexible substrate
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Molecular layer deposition using reduction process
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Fast atomic layer deposition process using seed precursor
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Printing of colored pattern using atomic layer deposition
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Injection Assembly in Linear Deposition Apparatus with Bulging Ridges Extending along Bottom Openings
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Linear Deposition Apparatus with Modular Assembly
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Performing atomic layer deposition on large substrate using scanning reactors
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Thin film formation for device sensitive to environment
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Cascaded plasma reactor
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Hydrophobic and oleophobic encapsulation material with alternating layers
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Depositing thin layer of material on permeable substrate
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Hydrophobic and Oleophobic Encapsulation Material with Alternating Layers
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Radical reactor with inverted orientation
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Radical reactor with multiple plasma chambers
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