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VEECO ALD INC

Overview
  • Total Patents
    92
  • GoodIP Patent Rank
    25,741
About

VEECO ALD INC has a total of 92 patent applications. Its first patent ever was published in 2010. It filed its patents most often in United States, Republic of Korea and Taiwan. Its main competitors in its focus markets surface technology and coating, electrical machinery and energy and semiconductors are LOTUS APPLIED TECH LLC, KORNIC ENC CO LTD and INTELLIGENT SYSTEM INC.

Patent filings per year

Chart showing VEECO ALD INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Lee Sang In 79
#2 Pak Samuel S 24
#3 Hwang Chang Wan 13
#4 Lee Daniel Ho 10
#5 Yoon Jeong Ah 10
#6 Lee Sang-In 10
#7 Yang Hyoseok Daniel 9
#8 Yang Daniel 5
#9 Cha Suk Yal 5
#10 Lee Daniel H 5

Latest patents

Publication Filing date Title
US2017107614A1 Multi-Step Atomic Layer Deposition Process for Silicon Nitride Film Formation
US2016032452A1 Atomic Layer Deposition Method Using Source Precursor Transformed by Hydrogen Radical Exposure
US2015299857A1 Deposition device with auxiliary injectors for injecting nucleophile gas and separation gas
US2015275365A1 Atomic Layer Deposition Using Injector Module Arrays
EP3119922A1 Cleaning of deposition device by injecting cleaning gas into deposition device
CN106103794A Utilize the spatial deposition of the reciprocating material of short distance
US2015159271A1 Deposition of non-isostructural layers for flexible substrate
US2015148557A1 Molecular layer deposition using reduction process
WO2015057581A1 Fast atomic layer deposition process using seed precursor
WO2015047832A1 Printing of colored pattern using atomic layer deposition
US2015361548A1 Injection Assembly in Linear Deposition Apparatus with Bulging Ridges Extending along Bottom Openings
US2015360242A1 Linear Deposition Apparatus with Modular Assembly
KR20150140357A Performing atomic layer deposition on large substrate using scanning reactors
US2014319488A1 Thin film formation for device sensitive to environment
US2014205769A1 Cascaded plasma reactor
KR20140064656A Hydrophobic and oleophobic encapsulation material with alternating layers
US2014037853A1 Depositing thin layer of material on permeable substrate
US2014141191A1 Hydrophobic and Oleophobic Encapsulation Material with Alternating Layers
US2015125627A1 Radical reactor with inverted orientation
KR20140138328A Radical reactor with multiple plasma chambers