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AVANTOR PERFORMANCE MAT INC

Overview
  • Total Patents
    208
  • GoodIP Patent Rank
    105,322
About

AVANTOR PERFORMANCE MAT INC has a total of 208 patent applications. Its first patent ever was published in 1999. It filed its patents most often in Israel, Malaysia and China. Its main competitors in its focus markets basic materials chemistry, optics and semiconductors are MALLINCKRODT BAKER INC, BUBBLES AND BEYOND GMBH and GEN CHEMICAL PERFORMANCE PRODU.

Patent filings per year

Chart showing AVANTOR PERFORMANCE MAT INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Deorkar Nandu 59
#2 Westwood Glenn 33
#3 Farina James 31
#4 Miinea Liliana 25
#5 Gemmill William R 19
#6 Randive Sameer 18
#7 Hsu Chien-Pin Sherman 17
#8 Inaoka Seiji 15
#9 Kim Sang In 12
#10 Kane Sean M 12

Latest patents

Publication Filing date Title
WO2015148916A2 Package system and method for inhibiting moisture entry
US2015170936A1 Rinsing solution to prevent TiN pattern collapse
US2013224898A1 Compositions and methods for texturing polycrystalline silicon wafers
EP2764079A1 Microelectronic substrate cleaning compositions having copper/azole polymer inhibition
EP2715783A1 Semi-aqueous polymer removal compositions with enhanced compatibility to copper, tungsten, and porous low- dielectrics
BR112013028044A2 allylamine based chromatographic medium and its derivatives for protein purification
IL213936D0 Solution for increasing wafer sheet resistance and/or photovoltaic cell power density level
WO2011163153A1 Metal sulfide deposition using alkylated thioureas
TW201138974A Process for trypsin and chymotrypsin purification utilizing hydrophobic interaction chromatography
WO2011084887A1 Chemical compositions for wet chemical modification of sapphire surfaces
AU2010218275A1 Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers
AU2010218426A1 Multipurpose acidic, organic solvent based microelectronic cleaning composition
AU2009316812A1 Directly compressible granular microcrystalline cellulose based excipient, manufacturing process and use thereof
MX2011005163A New chromatographic media based on phenoxy alkyl and alkoxy-or phenoxy-phenyl alkyl ligands.
TW201116650A Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition
KR20140120376A Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition
MX2010003717A Directly compressible high functionality granular microcrystalline cellulose based excipient, manufacturing process and use thereof.
TW200732865A Stabilized, non-aqueous cleaning compositions for microelectronics substrates
MY141998A Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof
MY144940A Chromatographic media