| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 4 | |
| #2 | WIPO (World Intellectual Property Organization) | 4 | |
| #3 | China | 2 | |
| #4 | EPO (European Patent Office) | 2 | |
| #5 | Republic of Korea | 1 | |
| #6 | Taiwan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Basic materials chemistry | |
| #2 | Semiconductors | |
| #3 | Optics | |
| #4 | Surface technology and coating | |
| #5 | Medical technology |
| # | Technology | |
|---|---|---|
| #1 | Soaps | |
| #2 | Semiconductor devices | |
| #3 | Photomechanical semiconductor production | |
| #4 | Metallic material cleaning | |
| #5 | Diagnosis and surgery |
| # | Name | Total Patents |
|---|---|---|
| #1 | Naghshineh Shahriar | 11 |
| #2 | Barnes Jeff | 9 |
| #3 | Hashemi Yassaman | 5 |
| #4 | Oldak Ewa B | 4 |
| #5 | Xu Dingying | 4 |
| #6 | Hashemi Y | 1 |
| #7 | Naghshineh S | 1 |
| #8 | Dingying Xu | 1 |
| #9 | Naghshineh Shahrier | 1 |
| #10 | Eckhouse Shimon | 1 |
| Publication | Filing date | Title |
|---|---|---|
| US2003017962A1 | Cleaning compositions | |
| US6492308B1 | Post chemical-mechanical planarization (CMP) cleaning composition | |
| US6194366B1 | Post chemical-mechanical planarization (CMP) cleaning composition | |
| US5405368A | Method and apparatus for therapeutic electromagnetic treatment |