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WO2021081304A1
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Radio frequency (rf) power imbalancing in a multi-station integrated circuit fabrication chamber
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WO2021081213A1
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Determination of recipe for manufacturing semiconductor
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WO2021081123A1
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Semiconductor equipment module fabrication with additive manufacturing
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Monolithic anisotropic substrate supports
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WO2021081000A1
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Heat and volatile-organic-compounds detecting systems
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WO2021076746A1
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Selective attachment to enhance sio2:sinx etch selectivity
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WO2021076636A1
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Molybdenum fill
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WO2021076527A1
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Dual plenum fractal showerhead
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WO2021071999A1
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Semiconductor substrate bevel cleaning
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WO2021072042A1
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Positive tone development of cvd euv resist films
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WO2021072040A1
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Inorganic coating of plasma chamber component
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WO2021071767A1
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Autoclean for load locks in substrate processing systems
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WO2021071765A1
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Power source isolation circuits for heater elements of substrate supports of substrate processing systems
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WO2021067632A2
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Substrate surface modification with high euv absorbers for high performance euv photoresists
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WO2021067419A1
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Wafer shielding for prevention of lipseal plate-out
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WO2021067239A1
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Metrology module with parallel acquisition of broadband polarized spectra
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WO2021076321A1
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In-situ monitoring of substrate surfaces
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WO2021067160A1
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Radio frequency distribution circuits including transformers and/or transformer coupled combiners
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WO2021061907A1
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Tunable and non-tunable heat shields to affect temperature distribution profiles of substrate supports
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WO2021067118A1
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Selective graphene deposition using remote plasma
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