KLA TENCOR TECHNOLOGIES has a total of 19 patent applications. Its first patent ever was published in 1999. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets measurement, optics and semiconductors are KLA TENCOR TECH CORP, KLA TENCOR INC and ACCENT OPTICAL TECH INC.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 15 | |
#2 | WIPO (World Intellectual Property Organization) | 2 | |
#3 | China | 1 | |
#4 | Israel | 1 |
# | Industry | |
---|---|---|
#1 | Measurement | |
#2 | Optics | |
#3 | Semiconductors | |
#4 | Electrical machinery and energy | |
#5 | Computer technology | |
#6 | Machine tools | |
#7 | Machines | |
#8 | Control | |
#9 | Environmental technology |
# | Name | Total Patents |
---|---|---|
#1 | Fielden John | 3 |
#2 | Brown Kyle A | 3 |
#3 | Wack Dan | 3 |
#4 | Levy Ady | 3 |
#5 | Nikoonahad Mehrdad | 3 |
#6 | Bultman Gary | 3 |
#7 | Trikas Thanassis | 2 |
#8 | Mccauley Sharon | 2 |
#9 | Shinagawa Robert | 2 |
#10 | Lehman Kurt | 2 |
Publication | Filing date | Title |
---|---|---|
US2005270524A1 | Broadband wavelength selective filter | |
US6902855B2 | Qualifying patterns, patterning processes, or patterning apparatus in the fabrication of microlithographic patterns | |
US6882437B2 | Method of detecting the thickness of thin film disks or wafers | |
US6930765B2 | Multiple spot size optical profilometer, ellipsometer, reflectometer and scatterometer | |
US6646737B2 | Submicron dimensional calibration standards and methods of manufacture and use | |
US6673637B2 | Methods and systems for determining a presence of macro defects and overlay of a specimen | |
US6891167B2 | Apparatus and method for applying feedback control to a magnetic lens | |
US6879391B1 | Particle detection method and apparatus | |
US6690010B1 | Chemical analysis of defects using electron appearance spectroscopy |