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ACCENT OPTICAL TECH INC

Overview
  • Total Patents
    94
About

ACCENT OPTICAL TECH INC has a total of 94 patent applications. Its first patent ever was published in 2001. It filed its patents most often in WIPO (World Intellectual Property Organization), United States and Taiwan. Its main competitors in its focus markets measurement, optics and semiconductors are KLA TENCOR TECHNOLOGIES, NANOMETRICS INC and KLA TENCOR INC.

Patent filings per year

Chart showing ACCENT OPTICAL TECH INCs patent filings per year from 1900 to 2020

Focus industries

Top inventors

# Name Total Patents
#1 Raymond Christopher J 30
#2 Littau Michael E 18
#3 Raymond Chris 15
#4 Hummel Steve 14
#5 Smith Nigel Peter 10
#6 Krukar Richard H 9
#7 Sandusky John V 7
#8 Wilson Scott R 7
#9 Farrer Steve W 6
#10 Wang Shih Chun 6

Latest patents

Publication Filing date Title
US2007000434A1 Apparatuses and methods for detecting defects in semiconductor workpieces
TW200643472A Apparatus and methods for scatterometry of optical devices
WO2006093800A1 Apparatus and method for enhanced critical dimension scatterometry
US2007176119A1 Apparatuses and methods for analyzing semiconductor workpieces
EP1678466A2 Line profile asymmetry measurement
WO2006080902A2 Method and apparatus for determining line characteristics, e.g., line roughness, of microfeature components
WO2004107433A1 Apparatus and method for photo-thermal dopant activation in semiconductors
TW200424499A Determination of center of focus by parameter variability analysis
US2004233445A1 Determination of center of focus by parameter variability analysis
WO2004081988A2 Model pattern simulation of semiconductor wafer processing steps
WO2004055528A2 Apparatus and method for electrical characterization of semiconductors
AU2003241304A8 Scatterometric measurement of undercut multi-layer diffracting structures
TW200307116A Scatterometric measurement of undercut multi-layer diffracting structures
DE10311658A1 Procedure for determining a characteristic of a semiconductor sample, involves lighting up a surface of the semiconductor sample at the same time with overlaid energizing light source such as a laser of a specific wavelengths
TW200416380A Determination of center of focus by cross-section analysis
CN1599886A Determination of center of focus by cross-section analysis
IL157691D0 Line profile asymmetry measurement using scatterometry
TW567308B Differential numerical aperture methods and device
US6750968B2 Differential numerical aperture methods and device
US6728663B2 Structure identification using scattering signatures