| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Japan | 113 |
| # | Industry | |
|---|---|---|
| #1 | Measurement | |
| #2 | Optics | |
| #3 | Semiconductors | |
| #4 | Computer technology | |
| #5 | Electrical machinery and energy |
| # | Name | Total Patents |
|---|---|---|
| #1 | Fielden John | 13 |
| #2 | Park Allen | 11 |
| #3 | Yung-Ho Alex Chuang | 11 |
| #4 | Chang Ellis | 11 |
| #5 | Christopher F Bevis | 8 |
| #6 | Khurram Zafar | 8 |
| #7 | Rose Peter | 8 |
| #8 | Sagar Kekare | 8 |
| #9 | Ilya Bezel | 7 |
| #10 | Anatoly Fabrikant | 7 |
| Publication | Filing date | Title |
|---|---|---|
| JP2014160874A | Order selected overlay metrology | |
| JP2013122454A | Method and device for measuring shape and thickness variation of wafer having large diameter | |
| JP2013098567A | Apparatus and method for correcting aberration in electron beam based system | |
| JP2012182467A | Z stage with dynamically driven stage mirror and chuck assembly | |
| JP2012068232A | Multi-spot irradiation for wafer inspection |