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KLA TENCOR TECH CORP

Overview
  • Total Patents
    814
  • GoodIP Patent Rank
    221,654
About

KLA TENCOR TECH CORP has a total of 814 patent applications. Its first patent ever was published in 1995. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and EPO (European Patent Office). Its main competitors in its focus markets measurement, optics and electrical machinery and energy are XINIX INC, KLA TENCOR INC and KLA INSTR CORP.

Patent filings per year

Chart showing KLA TENCOR TECH CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Levy Ady 62
#2 Chuang Yung-Ho 52
#3 Bevis Christopher F 42
#4 Vaez-Iravani Mehdi 40
#5 Nikoonahad Mehrdad 39
#6 Fielden John 38
#7 Armstrong J Joseph 34
#8 Wack Dan 34
#9 Ghinovker Mark 33
#10 Adler David L 33

Latest patents

Publication Filing date Title
CN102804063A Inspection systems and methods for detecting defects on extreme ultraviolet mask blanks
US2009063378A1 Apparatus and methods for predicting a semiconductor parameter across an area of a wafer
US7826072B1 Method for optimizing the configuration of a scatterometry measurement system
US2008129988A1 Methods and systems for identifying defect types on a wafer
US7838833B1 Apparatus and method for e-beam dark imaging with perspective control
US2009114837A1 Dynamic pattern generator with cup-shaped structure
US7453274B1 Detection of defects using transient contrast
US7855362B1 Contamination pinning for auger analysis
US7828622B1 Sharpening metal carbide emitters
US7525649B1 Surface inspection system using laser line illumination with two dimensional imaging
WO2008042903A2 Systems for sensing pressure/shear force
US7804866B1 Pulse stretcher
US2008077894A1 Method for generating a design rule map having spatially varying overlay budget
US8000905B1 Computer-implemented methods, carrier media, and systems for determining sizes of defects detected on a wafer
US2009070055A1 Intelligent inspection based on test chip probe failure maps
US2009067797A1 Optical waveguide radiation control
US2009059215A1 Systems and method for simultaneously inspecting a specimen with two distinct channels
WO2008027543A2 Confocal secondary electron imaging
US2009040525A1 Systems configured to inspect a wafer
US2009043527A1 Computer-implemented methods, carrier media, and systems for generating a metrology sampling plan