ADVANCED MICRO FABRICATION EQUIPMENT SHANGHAI CO LTD has a total of 63 patent applications. Its first patent ever was published in 2008. It filed its patents most often in Taiwan and China. Its main competitors in its focus markets electrical machinery and energy, semiconductors and surface technology and coating are COLLINS KENNETH S, ADVANCED MICRO FAB EQUIP INC and VARIAN SEMICONDUCTOR EQUIPMENT.
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Semiconductor devices | |
#3 | Coating metallic material | |
#4 | Cleaning | |
#5 | Magnets and transformers | |
#6 | Plasma technique | |
#7 | Measuring light | |
#8 | Making microstructural devices |
# | Name | Total Patents |
---|---|---|
#1 | Liang Jie | 13 |
#2 | Ni Tuqiang | 11 |
#3 | Wu Di | 9 |
#4 | Yang Ping | 7 |
#5 | Ni Tu Qiang | 6 |
#6 | Wang Hong-Qing | 6 |
#7 | Ye Ru Bin | 5 |
#8 | Zuo Tao-Tao | 5 |
#9 | Huang Zhilin | 4 |
#10 | Du Ruo-Xin | 3 |
Publication | Filing date | Title |
---|---|---|
TW201241867A | Radio frequency shielding fence for plasma process reaction chamber | |
CN101998749A | Device for processing inductive coupling plasmas | |
CN101819933A | Plasma etching method for carbon-containing bed | |
CN101736326A | Capacitively coupled plasma processing reactor |