| # | Country | Total Patents | |
|---|---|---|---|
| #1 | France | 4 | |
| #2 | EPO (European Patent Office) | 3 | |
| #3 | Japan | 3 | |
| #4 | Canada | 1 | |
| #5 | United States | 1 |
| # | Industry | |
|---|---|---|
| #1 | Optics | |
| #2 | Measurement | |
| #3 | Semiconductors |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Optical systems | |
| #3 | Semiconductor devices | |
| #4 | Special measuring | |
| #5 | Measuring length, angles and areas |
| # | Name | Total Patents |
|---|---|---|
| #1 | Tigreat Paul | 6 |
| #2 | Berger Laurent | 5 |
| #3 | Hignette Olivier | 3 |
| #4 | Pooru Teigurea | 3 |
| #5 | Rooran Berujiyu | 2 |
| #6 | Rooran Perujiyu | 1 |
| #7 | Oribuie Inietsuto | 1 |
| Publication | Filing date | Title |
|---|---|---|
| EP0088691A1 | Alignment apparatus for machines making integrated circuits | |
| FR2530354A1 | DEVICE FOR IMPRESSING A TRACE ON THE FLIGHT ON A PHOTOSENSITIVE LAYER | |
| EP0063980A1 | Projection apparatus with a focusing device | |
| EP0065429A1 | Method and apparatus for the optical measurement of displacement, and its application to step and repeat photoreproduction |