CMP ROHM AND HAAS ELECTRONIC M has a total of 16 patent applications. Its first patent ever was published in 2003. It filed its patents most often in China. Its main competitors in its focus markets basic materials chemistry, semiconductors and machine tools are NIHON CABOT MICROELECTRONICS K K, CABOT MICROELECTRONICS CORP and ANJI MICROELECTRONICS TECH SHANGHAI CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | China | 16 |
# | Industry | |
---|---|---|
#1 | Basic materials chemistry | |
#2 | Semiconductors | |
#3 | Machine tools | |
#4 | Surface technology and coating | |
#5 | Machines | |
#6 | Transport | |
#7 | Civil engineering |
# | Technology | |
---|---|---|
#1 | Polishing compositions | |
#2 | Semiconductor devices | |
#3 | Materials for miscellaneous applications | |
#4 | Grinding or polishing devices | |
#5 | Unspecified technologies | |
#6 | Metallic material removal | |
#7 | Fire-fighting | |
#8 | Grinding tools | |
#9 | Soaps | |
#10 | Ships |
# | Name | Total Patents |
---|---|---|
#1 | Zhendong Liu | 4 |
#2 | Jinru Bian | 4 |
#3 | John Quanci | 4 |
#4 | So Joseph K | 3 |
#5 | Thomas Terence M | 3 |
#6 | Muldowney Gregory P | 2 |
#7 | Ameen Joseph G | 2 |
#8 | Haofeng Xu | 1 |
#9 | Mueller Brian L | 1 |
#10 | Hongyu Wang | 1 |
Publication | Filing date | Title |
---|---|---|
CN1598062A | Particle-free polishing fluid for nickel-based coating planarization |