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ANJI MICROELECTRONICS TECH SHANGHAI CO LTD

Overview
  • Total Patents
    38
  • GoodIP Patent Rank
    40,983
  • Filing trend
    ⇩ 76.0%
About

ANJI MICROELECTRONICS TECH SHANGHAI CO LTD has a total of 38 patent applications. It decreased the IP activity by 76.0%. Its first patent ever was published in 2016. It filed its patents most often in China, WIPO (World Intellectual Property Organization) and United States. Its main competitors in its focus markets basic materials chemistry, semiconductors and surface technology and coating are ANJI MICROELECTRONICS (SHANGHAI) CO LTD, DUPONT AIR PROD NANOMATERIALS and NIHON CABOT MICROELECTRONICS K K.

Patent filings in countries

World map showing ANJI MICROELECTRONICS TECH SHANGHAI CO LTDs patent filings in countries

Patent filings per year

Chart showing ANJI MICROELECTRONICS TECH SHANGHAI CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Wang Yuchun 21
#2 Jing Jianfen 18
#3 Cai Xinyuan 15
#4 Pan Yijun 14
#5 Yin Xiansheng 13
#6 Yao Ying 13
#7 Jia Changzheng 13
#8 Yang Junya 13
#9 Du Lingxi 12
#10 Song Kai 12

Latest patents

Publication Filing date Title
CN109251672A A kind of chemical mechanical polishing liquid
CN109251674A A kind of chemical mechanical polishing liquid
CN109251673A A kind of chemical mechanical polishing liquid
CN109251676A A kind of chemical mechanical polishing liquid
CN109251671A A kind of chemical mechanical polishing liquid
CN109251675A A kind of chemical mechanical polishing liquid
CN108624234A A kind of chemical mechanical polishing liquid
CN108250972A A kind of chemical mechanical polishing liquid for barrier layer planarization
CN108251845A A kind of chemical mechanical polishing liquid and its application
CN108250973A A kind of chemical mechanical polishing liquid for barrier layer planarization
CN108250977A A kind of chemical mechanical polishing liquid for barrier layer planarization
CN108249468A A kind of preparation method of cerium oxide crystalline and its application in chemical mechanical polishing liquid
CN108250975A A kind of chemical mechanical polishing liquid and its application
CN108249469A A kind of cerium oxide preparation method and the CMP planarization liquid containing the cerium oxide
CN108257863A A kind of cmp method
CN108250978A A kind of chemical mechanical polishing liquid and its application
CN108117839A A kind of chemical mechanical polishing liquid with high silicon nitride selectivity
CN108121176A A kind of low etching photoresist residual washing liquid
CN108117840A A kind of silicon nitride chemical mechanical polishing liquid
CN108121175A A kind of fluorine-containing cleaning solution