NIHON CABOT MICROELECTRONICS K K

Overview

About

NIHON CABOT MICROELECTRONICS K K has a total of 13 patent applications. Its first patent ever was published in 2014. It filed its patents most often in WIPO (World Intellectual Property Organization), Republic of Korea and China. Its main competitors in its focus markets basic materials chemistry, semiconductors and machine tools are CMP ROHM AND HAAS ELECTRONIC M, ANJI MICROELECTRONICS TECH SHANGHAI CO LTD and CABOT MICROELECTRONICS CORP.

Patent filings in countries

#	Country	Total Patents
#1	WIPO (World Intellectual Property Organization)	5
#2	Republic of Korea	3
#3	China	2
#4	United States	2
#5	Taiwan	1

#	Industry
#1	Basic materials chemistry
#2	Semiconductors
#3	Machine tools
#4	Chemical engineering
#5	Macromolecular chemistry and polymers

#	Technology
#1	Polishing compositions
#2	Semiconductor devices
#3	Materials for miscellaneous applications
#4	Grinding or polishing devices
#5	Cleaning
#6	Soaps
#7	Macromolecular compounds compositions

Publication	Filing date	Title
WO2020255862A1	2020-06-11	Chemical-mechanical polishing composition, rinse composition, chemical-mechanical polishing method, and rinsing method
WO2020013332A1	2019-07-12	Chemical mechanical polishing composition, rinsing composition, chemical mechanical polishing method and rinsing method
KR20160135752A	2015-03-17	Slurry composition and method for polishing substrate
TW201446903A	2014-04-25	Slurry composition and method of substrate polishing