| # | Country | Total Patents | |
|---|---|---|---|
| #1 | WIPO (World Intellectual Property Organization) | 3 | |
| #2 | China | 2 | |
| #3 | Republic of Korea | 2 | |
| #4 | Singapore | 2 | |
| #5 | Taiwan | 2 | |
| #6 | United States | 2 | |
| #7 | EPO (European Patent Office) | 1 |
| # | Industry | |
|---|---|---|
| #1 | Basic materials chemistry | |
| #2 | Machine tools | |
| #3 | Semiconductors | |
| #4 | Consumer goods | |
| #5 | Materials and metallurgy |
| # | Name | Total Patents |
|---|---|---|
| #1 | Shigeta Takashi | 14 |
| #2 | Hosoi Daisuke | 14 |
| #3 | Machida Shingo | 7 |
| #4 | Inoue Yuki | 1 |
| #5 | Kubota Naoki | 1 |
| #6 | Suzuki Takamasa | 1 |
| Publication | Filing date | Title |
|---|---|---|
| WO2020066998A1 | Polishing liquid, concentrate of same, method for producing polished article using polishing liquid, and polishing method of substrate using polishing liquid | |
| WO2018020931A1 | Abrasive grains, manufacturing method therefor, polishing slurry containing said abrasive grains, and polishing method using said polishing slurry | |
| SG185033A1 | Sapphire polishing slurry and sapphire polishing method |