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ANJI MICROELECTRONICS (SHANGHAI) CO LTD

Overview
  • Total Patents
    34
  • GoodIP Patent Rank
    48,640
About

ANJI MICROELECTRONICS (SHANGHAI) CO LTD has a total of 34 patent applications. Its first patent ever was published in 2013. It filed its patents most often in China and Taiwan. Its main competitors in its focus markets basic materials chemistry, semiconductors and optics are ANJI MICROELECTRONICS TECH SHANGHAI CO LTD, NIHON CABOT MICROELECTRONICS K K and ANJI MICROELECTRONICS SHANGHAI CO LTD.

Patent filings in countries

World map showing ANJI MICROELECTRONICS (SHANGHAI) CO LTDs patent filings in countries
# Country Total Patents
#1 China 30
#2 Taiwan 4

Patent filings per year

Chart showing ANJI MICROELECTRONICS (SHANGHAI) CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Cai Xinyuan 9
#2 Jing Jianfen 9
#3 Wang Yuchun 8
#4 Liu Bing 8
#5 Yin Xiansheng 7
#6 Jia Changzheng 7
#7 Song Kai 5
#8 Wang Chen 5
#9 Yang Junya 4
#10 Yao Ying 4

Latest patents

Publication Filing date Title
CN106929867A Cleaning fluid and its application method after a kind of polishing for metal substrate
CN106927495A A kind of preparation method and its CMP application of cerium oxide
CN106928859A A kind of chemical mechanical polishing liquid and its application
CN106929868A Cleaning fluid and its application method after a kind of polishing for metal substrate
CN106933068A A kind of cleaning fluid of the removal photoetching glue residue of low etching
CN106928860A A kind of chemical mechanical polishing liquid and its application for STI fields
CN106929858A Chemical mechanical polishing of metals slurry
CN106928862A A kind of chemical mechanical polishing liquid and its polish ULK- copper-connection processing procedures in barrier layer application
CN106928863A A kind of acid polishing slurry for barrier polishing
CN106928861A A kind of barrier layer chemical mechanical polishing liquid of alkalescence
CN106928855A A kind of acidic chemical machine polishing liquor
CN106928857A A kind of acidic chemical machine polishing liquor
CN106933067A A kind of photoresistance residual washing liquid composition rich in water
CN106928856A A kind of acidic chemical machine polishing liquor
CN106928858A A kind of chemical mechanical polishing liquid for barrier layer planarization
CN106919013A A kind of cleaning fluid of the removal photoresistance residue of low etching
CN106919011A A kind of azanol rich in water peels off cleaning fluid
CN106916567A A kind of cerium oxide abrasives preparation method and its CMP planarization application
CN106914036A A kind of method of purification of organic acid
CN106916536A A kind of alkaline chemical mechanical polishing liquid