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CHEME INC

Overview
  • Total Patents
    23
  • GoodIP Patent Rank
    71,146
  • Filing trend
    ⇩ 20.0%
About

CHEME INC has a total of 23 patent applications. It decreased the IP activity by 20.0%. Its first patent ever was published in 2015. It filed its patents most often in Republic of Korea, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets optics, macromolecular chemistry and polymers and organic fine chemistry are LOUM HITECH CO LTD, UTSUMI YOSHIYUKI and OCG MICROELECTRONIC MATERIALS.

Patent filings in countries

World map showing CHEME INCs patent filings in countries

Patent filings per year

Chart showing CHEME INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kim Sung Hyun 18
#2 Heo Yoon Hee 17
#3 Kim Sang Ha 16
#4 Kim Sunghyun 5
#5 Kim Se Hun 5
#6 Kim Da Eun 3
#7 Sakong Chun 3
#8 Do Hee Jin 3
#9 Kim Sangha 3
#10 Choi Kyungsoo 2

Latest patents

Publication Filing date Title
KR20210033855A Ultraviolet- absorbent compound and encapsulant composition comprising same
KR20200099918A Cardo-based polymer resin containing amide-group, and method for producing the same, and products containing the same
KR20200083800A Polyamide-based compound and composition including the same
KR20200064334A Polyimide-based compound and composition including the same
KR20190074096A New compound, photo-curable composition containing the same, and cured product thereof
KR20190011578A Carbazole derivatives, photopolymerization initiator and photoresist composition containing the same
KR101860095B1 Ultraviolet curable composition for flexible oled and use thereof
WO2017023067A2 Fluorene derivative, and photopolymerization initiator and photoresist composition containing same
KR20170136698A Photoactive compound, photopolymerization initiator and photoresist composition containing the same
KR20170120397A Xanthene dye compounds and photoresist composition containing the same
KR101740632B1 Cardo-based binder resin, and photo-sensitive resin composition comprising the same
KR20170089557A Carbazole derivatives, photopolymerization initiator and photoresist composition containing the same
KR20170028205A Adhesion promoter for photo-resist, and photo-sensitive resin composition comprising the same
KR20170023448A Fluorene derivatives, photopolymerization initiator and photoresist composition containing the same
KR20170014833A Fluorene derivatives, photopolymerization initiator and photoresist composition containing the same
KR101587778B1 High-branched dendritic alkali-soluble binder resin, and manufacturing method thereof, and photosensitive resin composition comprising the same