Learn more

LOUM HITECH CO LTD

Overview
  • Total Patents
    16
  • GoodIP Patent Rank
    119,531
  • Filing trend
    ⇩ 100.0%
About

LOUM HITECH CO LTD has a total of 16 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2012. It filed its patents most often in Republic of Korea. Its main competitors in its focus markets optics, organic fine chemistry and macromolecular chemistry and polymers are TAKOMA TECH CO LTD, HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD and CHEME INC.

Patent filings in countries

World map showing LOUM HITECH CO LTDs patent filings in countries
# Country Total Patents
#1 Republic of Korea 16

Patent filings per year

Chart showing LOUM HITECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Park Joo Hyeon 16
#2 Oh Jung Hoon 6
#3 Choi Ik Ho 5
#4 Choi Jae Du 3
#5 Lee Joung Beom 2
#6 Park Jisu 2
#7 Yoon Hyoung Joon 2
#8 Lee Yun Min 2
#9 An Geum Sil 1
#10 Kim Jae Kyoung 1

Latest patents

Publication Filing date Title
KR102204845B1 Fluoropolyether modifided amine compounds, curable composition containing the same, and cured product thereof
KR102148772B1 Novel polymer, resist underlayer film composition containing the polymer, and process for forming resist pattern using the composition
KR102101275B1 Novel polymer and resist underlayer film composition containing the same
KR102122269B1 Fluoropolyether derivative, curable composition containing the same, and cured product thereof
KR101984867B1 Resist underlayer film composition used in semiconductor production process comprising fluorene compounds
KR20190061906A sulfonic acid salt, resist composition containing the same, and method of forming pattern using the same
KR101748820B1 new sulfonic acid salt and resist composition containing the same
KR20170135653A New compounds and underlayer film composition used in semiconductor production process using the same
KR101700150B1 New compounds and underlayer film composition used in semiconductor production process using the same
KR101682144B1 Organicsilicon compound and antifoiling coating composition comprising same
KR101602467B1 Novel polyurethane compounds and anti-reflective coating composition containing the same
KR101590608B1 Novel isocyanurate compounds and anti-reflective coating composition containing the same
KR101619469B1 Novel oxime ester compounds and photoresist composition containing the same
KR20150024233A New functional acid generator and photo resist composition comprising the same
KR101389421B1 New functional acid generator and photo resist composition comprising the same
KR101335388B1 Acid generators and resist compositions using novel sulfonic salts