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SAN APRO LTD

Overview
  • Total Patents
    116
  • GoodIP Patent Rank
    22,001
  • Filing trend
    ⇩ 94.0%
About

SAN APRO LTD has a total of 116 patent applications. It decreased the IP activity by 94.0%. Its first patent ever was published in 1990. It filed its patents most often in WIPO (World Intellectual Property Organization), Taiwan and Republic of Korea. Its main competitors in its focus markets organic fine chemistry, macromolecular chemistry and polymers and optics are SAN-APRO LTD, LOUM HITECH CO LTD and CHEME INC.

Patent filings per year

Chart showing SAN APRO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kimura Hideki 33
#2 Takashima Yusaku 23
#3 Ikeda Takuya 23
#4 Shiraishi Atsushi 20
#5 Shibagaki Tomoyuki 19
#6 Suzuki Issei 15
#7 Nakamura Yuji 14
#8 Yamamoto Jiro 13
#9 Yamashita Shinji 13
#10 Fukunaga Noriya 12

Latest patents

Publication Filing date Title
WO2021070491A1 Photocurable composition for nanoimprinting
WO2021053993A1 Acid generator and curable composition containing same
WO2021029158A1 Sulfonamide compound, nonionic photoacid generator, and photolithography resin composition
WO2020145043A1 Sulfonium salt, photoacid generator, curable composition and resist composition
WO2020059434A1 Epoxy resin composition
WO2020054356A1 Epoxy resin curing accelerator and epoxy resin composition
WO2019225185A1 Sulfonium salt, photoacid generator, curable composition, and resist composition
KR20190091436A Photoacid Generator and Resin Composition for Photolithography
WO2018074308A1 Photo-base generator and photosensitive composition
US2019284134A1 Sulfonium salt, heat- or photo-acid generator, heat- or photo-curable composition, and cured product thereof
US2019300476A1 Sulfonium salt, photoacid generator, photocurable composition, and cured product thereof
KR20190017757A Sulfonium salt, photoacid generator, curing composition and resist composition
CN107075088A Epoxy resin curing accelerator
EP3216783A1 Sulfonate compound, photoacid generator, and photolithographic resin composition
WO2015146053A1 Imide sulfonate compound, photoacid generator, and resin composition for photolithography
WO2015083331A1 Photobase generator
WO2015001804A1 Photoacid generator, and resin composition for photolithography
WO2014155960A1 Photobase generator
WO2014006855A1 Epoxy resin curing accelerator
KR20150071026A Sulfonium salt, photoacid generator, curable composition, and resist composition