| # | Country | Total Patents | |
|---|---|---|---|
| #1 | EPO (European Patent Office) | 13 | |
| #2 | Republic of Korea | 10 | |
| #3 | China | 7 |
| # | Technology | |
|---|---|---|
| #1 | Electric discharge tubes | |
| #2 | Semiconductor devices | |
| #3 | Coating metallic material | |
| #4 | Plasma technique | |
| #5 | Pulse technique | |
| #6 | Resonators | |
| #7 | Code conversion | |
| #8 | Electric digital data processing | |
| #9 | Capacitors and switching devices | |
| #10 | Amplifiers |
| # | Name | Total Patents |
|---|---|---|
| #1 | Shaw Denis | 9 |
| #2 | Fairbairn Kevin | 9 |
| #3 | Carter Daniel | 7 |
| #4 | Van Zyl Gideon Johannes Jacobus | 5 |
| #5 | Van Zyl Gideon | 5 |
| #6 | Pankratz Joshua B | 3 |
| #7 | Pelleymounter Douglas R | 3 |
| #8 | Krause Uwe | 3 |
| #9 | Pelleymounter Doug | 3 |
| #10 | Gurov Gennady | 2 |
| Publication | Filing date | Title |
|---|---|---|
| KR20210003773A | Apparatus, system and method for reducing crazing | |
| EP3763041A1 | Pin diode driver with energy recovery | |
| KR20200108844A | Low Power PIN Diode Driver | |
| CN111788655A | Spatial and temporal control of ion bias voltage for plasma processing | |
| KR20200100643A | Improved application of modulating supplies in plasma processing systems | |
| EP2606708A2 | Proactive arc management of a plasma load |