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DHINDSA RAJINDER

Overview
  • Total Patents
    50
About

DHINDSA RAJINDER has a total of 50 patent applications. Its first patent ever was published in 2002. It filed its patents most often in United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets electrical machinery and energy, semiconductors and surface technology and coating are HIMORI SHINJI, MI2 FACTORY GMBH and Zhongwei semiconductor equipment shanghai co ltd.

Patent filings in countries

World map showing DHINDSA RAJINDERs patent filings in countries

Patent filings per year

Chart showing DHINDSA RAJINDERs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Dhindsa Rajinder 50
#2 Marakhtanov Alexei 15
#3 Fischer Andreas 6
#4 Bailey Iii Andrew D 5
#5 Kozakevich Felix 5
#6 Rogers James H 4
#7 Srinivasan Mukund 4
#8 Li Lumin 4
#9 Hudson Eric 4
#10 Lenz Eric 4

Latest patents

Publication Filing date Title
US2014060739A1 Rf ground return in plasma processing systems and methods therefor
US2013220975A1 Hybrid plasma processing systems
US2013126475A1 Triode reactor design with multiple radiofrequency powers
US2012061350A1 Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same
US2012031559A1 Dual plasma volume processing apparatus for neutral/ion flux control
US2012034786A1 Plasma processing chamber with dual axial gas injection and exhaust
US2011011534A1 Apparatus for adjusting an edge ring potential during substrate processing
US2010040768A1 Temperature controlled hot edge ring assembly
US2010184298A1 Composite showerhead electrode assembly for a plasma processing apparatus
US2008237187A1 Method and apparatus for inducing DC voltage on wafer-facing electrode
US2008241420A1 Method and apparatus for DC voltage control on RF-powered electrode
US2009223810A1 Methods and arrangements for plasma processing system with tunable capacitance
US2008160776A1 Plasma-enhanced substrate processing method and apparatus
US2007199658A1 Integrated capacitive and inductive power sources for a plasma etching chamber
US2007193688A1 Process tuning gas injection from the substrate edge
US2005241766A1 Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
WO03034098A2 Alignment and packaging methods and apparatus for optoelectronic, micro-electro mechanical systems, and optical devices