SPUTTERING COMPONENTS INC has a total of 53 patent applications. It increased the IP activity by 150.0%. Its first patent ever was published in 2002. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets electrical machinery and energy, surface technology and coating and control are KAUFMAN & ROBINSON INC, FILPLAS VACUUM TECHNOLOGY PTE and NISSHIN ELECTRIC CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 16 | |
#2 | WIPO (World Intellectual Property Organization) | 9 | |
#3 | China | 8 | |
#4 | Republic of Korea | 7 | |
#5 | Taiwan | 6 | |
#6 | EPO (European Patent Office) | 5 | |
#7 | Japan | 2 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Surface technology and coating | |
#3 | Control | |
#4 | Chemical engineering | |
#5 | Environmental technology | |
#6 | Mechanical elements |
# | Name | Total Patents |
---|---|---|
#1 | Crowley Daniel Theodore | 35 |
#2 | Morse Patrick Lawrence | 34 |
#3 | German John Robert | 20 |
#4 | Neal Michelle Lynn | 12 |
#5 | Meredith William A | 11 |
#6 | Meredith Jr William A | 9 |
#7 | Crowley Daniel T | 8 |
#8 | Rooney Brian | 2 |
#9 | William A Meredith | 1 |
#10 | Daniel Theodore Crowley | 1 |
Publication | Filing date | Title |
---|---|---|
US2019057848A1 | Magnetic force release for sputtering sources with magnetic target materials | |
US2016064191A1 | Ion control for a plasma source | |
KR20170037882A | Sputtering apparatus | |
US2014246312A1 | Sputtering apparatus | |
CN105008585A | Plasma enhanced chemical vapor deposition (PECVD) source | |
US2015120001A1 | Decentralized process controller | |
US2014246310A1 | Sputtering apparatus | |
KR20150048142A | Sputtering apparatus | |
US2014007813A1 | Ion control for a plasma source | |
US2013032476A1 | Rotary cathodes for magnetron sputtering system | |
CN103354844A | Sputtering apparatus | |
US2011155568A1 | Indexing magnet assembly for rotary sputtering cathode | |
US2011024987A1 | Mechanical seal assembly for a rotatable shaft | |
US6905579B2 | Cylindrical magnetron target and spindle apparatus | |
US2003173217A1 | High-power ion sputtering magnetron |