Learn more

SPUTTERING COMPONENTS INC

Overview
  • Total Patents
    53
  • GoodIP Patent Rank
    74,096
  • Filing trend
    ⇧ 150.0%
About

SPUTTERING COMPONENTS INC has a total of 53 patent applications. It increased the IP activity by 150.0%. Its first patent ever was published in 2002. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and China. Its main competitors in its focus markets electrical machinery and energy, surface technology and coating and control are KAUFMAN & ROBINSON INC, FILPLAS VACUUM TECHNOLOGY PTE and NISSHIN ELECTRIC CO LTD.

Patent filings per year

Chart showing SPUTTERING COMPONENTS INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Crowley Daniel Theodore 35
#2 Morse Patrick Lawrence 34
#3 German John Robert 20
#4 Neal Michelle Lynn 12
#5 Meredith William A 11
#6 Meredith Jr William A 9
#7 Crowley Daniel T 8
#8 Rooney Brian 2
#9 William A Meredith 1
#10 Daniel Theodore Crowley 1

Latest patents

Publication Filing date Title
US2019057848A1 Magnetic force release for sputtering sources with magnetic target materials
US2016064191A1 Ion control for a plasma source
KR20170037882A Sputtering apparatus
US2014246312A1 Sputtering apparatus
CN105008585A Plasma enhanced chemical vapor deposition (PECVD) source
US2015120001A1 Decentralized process controller
US2014246310A1 Sputtering apparatus
KR20150048142A Sputtering apparatus
US2014007813A1 Ion control for a plasma source
US2013032476A1 Rotary cathodes for magnetron sputtering system
CN103354844A Sputtering apparatus
US2011155568A1 Indexing magnet assembly for rotary sputtering cathode
US2011024987A1 Mechanical seal assembly for a rotatable shaft
US6905579B2 Cylindrical magnetron target and spindle apparatus
US2003173217A1 High-power ion sputtering magnetron