|
US7807986B1
|
|
Ion implanter and method for adjusting ion beam
|
|
US7709364B1
|
|
Method and apparatus for low temperature ion implantation
|
|
US7750323B1
|
|
Ion implanter and method for implanting a wafer
|
|
US7745804B1
|
|
Ion implantation method and application thereof
|
|
US2009066031A1
|
|
Compound sliding seal unit suitable for atmosphere to vacuum applications
|
|
US2009090876A1
|
|
Implant beam utilization in an ion implanter
|
|
US2008029716A1
|
|
Apparatus and method for ion beam implantation using ribbon and spot beams
|
|
JP2007059395A
|
|
Ion beam implanting device and method
|
|
JP2007059394A
|
|
Ion beam implanting device and method
|
|
JP2006313750A
|
|
High resolution analyzer magnet with high aspect ratio for ribbon ion beam, and system
|
|
JP2006278316A
|
|
Radiation scanning arm and collimator for series-processing semiconductor wafer with ribbon beam
|
|
US2006163490A1
|
|
Ion implantation cooling system
|
|
TWI287831B
|
|
Cooling system for ion implantation
|
|
US2006113494A1
|
|
Apparatus and methods for ion beam implantation using ribbon and spot beams
|
|
TW200603301A
|
|
Method for preventing wafer defect for a batch-type ion implanter spinning direction particle
|
|
US2006102080A1
|
|
Reduced particle generation from wafer contacting surfaces on wafer paddle and handling facilities
|
|
US6806479B1
|
|
Apparatus and method for reducing implant angle variations across a large wafer for a batch disk
|
|
US2005019697A1
|
|
Method of treating wafers with photoresist to perform metrology analysis using large current e-beam systems
|
|
US2004244692A1
|
|
Method to accurately and repeatably setup an ion beam for an ion implantation system in reduced setup time to increase productivity
|
|
US6946667B2
|
|
Apparatus to decelerate and control ion beams to improve the total quality of ion implantation
|
