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Zhongwei semiconductor equipment shanghai co ltd

Overview
  • Total Patents
    12
  • GoodIP Patent Rank
    145,004
  • Filing trend
    ⇩ 100.0%
About

Zhongwei semiconductor equipment shanghai co ltd has a total of 12 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2017. It filed its patents most often in China. Its main competitors in its focus markets electrical machinery and energy, semiconductors and audio-visual technology are JEHARA CORP, ADVANCED ION BEAM TECHNOLOGY I and ACT ADVANCED CIRCUIT TESTING.

Patent filings in countries

World map showing Zhongwei semiconductor equipment shanghai co ltds patent filings in countries
# Country Total Patents
#1 China 12

Patent filings per year

Chart showing Zhongwei semiconductor equipment shanghai co ltds patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Liu Shenjian 5
#2 He Xiaoming 3
#3 Wu Di 3
#4 Zhao Kui 3
#5 Chen Xingjian 3
#6 Ni Tuqiang 3
#7 Zuo Taotao 2
#8 Xu Chaoyang 2
#9 Yang Jinquan 2
#10 Liu Jilin 1

Latest patents

Publication Filing date Title
CN109962001A A kind of operation method and plasma reactor of plasma chamber
CN109962000A A kind of plasma processing apparatus and its method reducing pollution particle
CN109961998A Plasma processing apparatus and the control method monitored based on focus ring thickness
CN109958681A A kind of fragile material apparatus for mounting part and its application
CN109961999A A kind of gas spray and the method for preventing accumulation of polymer
CN109962031A A kind of shielded electrostatic chuck and its application
CN109962030A A kind of electrostatic chuck
CN109961997A Plasma processing apparatus and its DC offset voltage control method
CN109961996A A kind of apparatus for processing plasma and with highly conductive composite magnetic material thereon
CN109957835A A kind of chemical vapor deposition or outer layer growth reactor and its interior rotary shaft
CN109920716A A kind of plasma processing apparatus and method of equilibrium etch rate
CN109920715A A kind of plasma etch reactor