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HOFFMAN DANIEL J

Overview
  • Total Patents
    16
About

HOFFMAN DANIEL J has a total of 16 patent applications. Its first patent ever was published in 2002. It filed its patents most often in United States. Its main competitors in its focus markets electrical machinery and energy, surface technology and coating and chemical engineering are N PROIZV PREDPR NOVATEKH, PLASMA QUEST LTD and SAINTECH PTY LTD.

Patent filings in countries

World map showing HOFFMAN DANIEL Js patent filings in countries
# Country Total Patents
#1 United States 16

Patent filings per year

Chart showing HOFFMAN DANIEL Js patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hoffman Daniel J 16
#2 Carter Daniel 5
#3 Buchberger Jr Douglas A 4
#4 Grilley Randy 3
#5 Peterson Karen 3
#6 Brouk Victor 3
#7 Pipitone John 3
#8 Brown Karl M 3
#9 Rui Ying 3
#10 Yang Jang Gyoo 2

Latest patents

Publication Filing date Title
US2014062303A1 Systems and methods for calibrating a switched mode ion energy distribution system
US2012242229A1 Remote plasma source generating a disc-shaped plasma
US2012187844A1 Electrostatic remote plasma source
US2012217221A1 System, method and apparatus for controlling ion energy distribution of a projected plasma
US2013001196A1 Projected plasma source
US2010096261A1 Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target
US2009314433A1 Cathode with inner and outer electrodes at different heights
US2009250335A1 Method of controlling plasma distribution uniformity by superposition of different constant solenoid fields
US2009250432A1 Method of controlling plasma distribution uniformity by time-weighted superposition of different solenoid fields
US2009229969A1 Physical vapor deposition method with a source of isotropic ion velocity distribution at the wafer surface
US2005167051A1 Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction