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ADVANCED ION BEAM TECH INC

Overview
  • Total Patents
    181
  • GoodIP Patent Rank
    13,322
  • Filing trend
    ⇧ 225.0%
About

ADVANCED ION BEAM TECH INC has a total of 181 patent applications. It increased the IP activity by 225.0%. Its first patent ever was published in 2007. It filed its patents most often in Taiwan, United States and China. Its main competitors in its focus markets electrical machinery and energy, semiconductors and surface technology and coating are LEE WILLIAM D, ADVANCED MICRO FABRICATION EQUIPMENT INC CHINA and FINK STEVEN T.

Patent filings in countries

World map showing ADVANCED ION BEAM TECH INCs patent filings in countries
# Country Total Patents
#1 Taiwan 66
#2 United States 44
#3 China 34
#4 Republic of Korea 21
#5 Japan 16

Patent filings per year

Chart showing ADVANCED ION BEAM TECH INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Wan Zhimin 59
#2 Ni Yu-Ho 19
#3 Saadatmand Kourosh 18
#4 Tang Daniel 17
#5 Pollock John D 16
#6 Berrian Don 14
#7 Sheng Tienyu 14
#8 Platow Wilhelm P 10
#9 Bai Xiao 10
#10 Shen Cheng Hui 9

Latest patents

Publication Filing date Title
US2021104378A1 Apparatus and method for reduction of particle contamination by bias voltage
TW202017007A Apparatus and method for cleaning the fluorinated surface inside the ion implanter
US2019301661A1 Vacuum jacketed tube
US2019197675A1 Calibration system with at least one camera and method thereof
US2018330973A1 Wafer charges monitoring
US2018315605A1 Method for Ion Implantation
US2018131293A1 Apparatus and method for monitoring the relative relationship between the wafer and the chuck
TW201807743A Applications of low density ion implantation
US2016233047A1 Plasma-based material modification with neutral beam
TW201725610A Method of improving the uniformity of ion implantation and corresponding ion implanter
US2016076142A1 Deposition Apparatus and Deposition Method Using the Same
TW201714677A Method of cleaning an esc
US2017110287A1 Ion implantation system and process
TW201711077A Plasma-based processing system and operation method thereof
TW201705225A Methond for generating lanthanide ion source
TWI557778B Ion implanter
US9450078B1 Forming punch-through stopper regions in finfet devices
TW201630024A An ion source with vaporizer
US2016217970A1 Ion implanter and method for ion implantation
US2016203950A1 Method and ion implanter for low temperature implantation