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Heating device and CVD equipment comprising same
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Plasma processing device and adjusting method thereof
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Plasma processing apparatus
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Nozzle, the spray gun comprising the nozzle and its working method
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Radio frequency electrode assembly and plasma processing apparatus
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Insulating material window, manufacturing method thereof and inductively coupled plasma processing device
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Gas regulating device and plasma etching equipment using same
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Support claw, airlock chamber and plasma processing device host platform
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Component for plasma chamber interior and method of making same
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Corrosion-resistant structure of gas delivery system in plasma processing device
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Plasma processing equipment
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Gas spray header, manufacturing method and plasma device comprising gas spray header
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Substrate for MOCVD and method for growing buffer layer on substrate
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ICP device and coil driving circuit and control method thereof
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Plasma reactor for ultra-aspect-ratio etching and etching method thereof
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Plasma processor and upper electrode assembly for plasma processor
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Deformable gas pipeline and vacuum processor with deformable gas pipeline
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Electrostatic chuck and plasma processing device with same
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