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CN106399970A
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Circular ring type low pressure chemical gas phase deposition cavity
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CN106319482A
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Booster-type chemical vapor deposition reaction cavity
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CN106350784A
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Double-row gas guide type low-pressure chemical gas-phase precipitation cavity
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CN106282970A
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Stay tube is propped up in the inducing QI in low pressure chemical phase precipitation chamber
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CN106245111A
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The wafer support structure in low pressure chemical phase precipitation chamber
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CN106399974A
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Normal pressure chemical gas phase deposition reaction cavity
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CN106399972A
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Low-pressure chemical vapor deposition cavity
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CN106381479A
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Wafer chemical vapor phase deposition reaction device
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CN106245004A
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Inside and outside jet-propelled low pressure chemical phase precipitation chamber
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CN106399971A
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Gas guide and support integrated low-pressure chemical vapor deposition cavity
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CN106381478A
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Air inlet structure of wafer chemical vapor deposition reaction device
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CN106334642A
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Wafer spraying device with height-adjustable supporting table
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CN106340478A
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Support bench of wafer spray apparatus
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CN106423646A
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Wafer spraying head structure with real-time height adjustment
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CN106269767A
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Integrated circuit workshop is with taking out dirt system
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CN106419739A
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Low-position ventilating and dust removing device for integrated circuit production workshop
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CN106391636A
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Low dust removal control system for integrated circuit production workshop
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CN106252262A
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The spray structure of wafer
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CN106419735A
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Ground dust sucking device used in integrated circuit production workshop
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CN106449494A
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Wafer-dedicated storage frame
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