Method Determining the position of structures on a mask
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Method for calibrating a measuring table of a coordinate measuring machine
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Method for compensating the tool induced shift in a coordinate measuring machine
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Device and method for determining the focus position
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Device for determining focus of optical system on substrate, has detector, which comprises four-quadrant diode, and individual quadrants of four-quadrant diode are interconnected in pairs such that two two-quadrant diodes are formed
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Coordinate measuring machine with temperature adapting station
DE102008002968A1
Interferometric device for position measurement and coordinate measuring machine
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Device for measuring positions of structures on a substrate
DE102008028869A1
Method and device for inspecting a disk-shaped object
DE102008002873A1
Method for use with coordinate measuring machine for locating area of minimum lens distortion of objective, involves measuring position of edge of structure on substrate at multiple different positions relative to optical axis of objective
DE102008002813A1
Test structure for determining position error with double patterning, has one unit and another unit, where former unit is provided on one mask and latter unit on another mask
DE102008002794A1
Method for determining parameter by application of wafers, involves removing wafers from reservoir with arm of robot, and wafer is positioned at part in image field of camera and lies on arm of robot
US2008204738A1
Method for acquiring high-resolution images of defects on the upper surface of the wafer edge
DE102008002780A1
Mask structure position determining method for use during semiconductor manufacturing, involves indicating structure on detector, and calculating position of structure from image of structure on detector
DE102008002778A1
Method for determining the position of at least one structure on a substrate
DE102008002779A1
Method for determining the travel range for focusing on a substrate
DE102008002770A1
Periodic structure's i.e. overlay mask, position determining method for use during e.g. overlay measurement, involves producing error relative to structure position from difference between model function and design data calculated function
WO2008110412A1
Method for producing artificial defects in semiconductor surfaces
DE102008002756A1
Apparatus for measuring or inspecting substrates of the semiconductor industry
DE102008002755A1
Method for determining a correction value for the measurement of positions of structures on a substrate
