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MICROCHEM CORP

Overview
  • Total Patents
    57
About

MICROCHEM CORP has a total of 57 patent applications. Its first patent ever was published in 2000. It filed its patents most often in WIPO (World Intellectual Property Organization), Taiwan and United States. Its main competitors in its focus markets optics, macromolecular chemistry and polymers and basic materials chemistry are GOO CHEM IND CO LTD, MASKLESS LITHOGRAPHY INC and CST AUTOMATION TECH CO LTD.

Patent filings per year

Chart showing MICROCHEM CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Johnson Donald W 18
#2 Nawrocki Daniel J 17
#3 Golden Jeremy V 15
#4 Mori Satoshi 11
#5 Honda Nao 11
#6 Weber William D 11
#7 Weber William 10
#8 Docanto Manuel 6
#9 Johnson Donald 6
#10 Miller Harris 5

Latest patents

Publication Filing date Title
US2015024326A1 Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
CN103874731A Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates
WO2012173721A1 Epoxy formulations and processes for fabrication of opaque structures
CN101971090A Low chlorine epoxy resin formulations
TW200923030A Compositions and processes for manufacturing printed electronics
US2008142478A1 Epoxy removal process for microformed electroplated devices
TW200813627A Photosensitive resin composition, laminate comprising the same, cured product of the same and method for forming pattern using the same (2)
CN101421826A Packaging of mems devices
WO2007109090A2 Packaging of mems devices
US2007134595A1 Pressurized aerosol formulation for use in radiation sensitive coatings
CA2605579A1 Method of forming a photoresist element
CN101176038A Method of forming a photoresist element
TW200613913A Photoimageable coating composition and composite article thereof
CN1934498A Permanent resist composition, cured product thereof, and use thereof
US2005266335A1 Photoimageable coating composition and composite article thereof
US6586560B1 Alkaline soluble maleimide-containing polymers
US6824952B1 Deep-UV anti-reflective resist compositions
US6716568B1 Epoxy photoresist composition with improved cracking resistance
US6303260B1 Dissolution rate modifiers for lift-off resists
US6395449B1 Poly-hydroxy aromatic dissolution modifiers for lift-off resists