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ECHEM SOLUTIONS CORP

Overview
  • Total Patents
    57
  • GoodIP Patent Rank
    54,946
  • Filing trend
    ⇧ 266.0%
About

ECHEM SOLUTIONS CORP has a total of 57 patent applications. It increased the IP activity by 266.0%. Its first patent ever was published in 2004. It filed its patents most often in Taiwan, China and United States. Its main competitors in its focus markets optics, macromolecular chemistry and polymers and semiconductors are OGIHARA TSUTOMU, AZ ELECTRONIC MAT (LUXEMBOURG) SARL and HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD.

Patent filings in countries

World map showing ECHEM SOLUTIONS CORPs patent filings in countries
# Country Total Patents
#1 Taiwan 29
#2 China 17
#3 United States 11

Patent filings per year

Chart showing ECHEM SOLUTIONS CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kuo Kuang Lung 11
#2 Chiu Chen-Wen 7
#3 Lou Chia-Hao 6
#4 Guanglang Guo 6
#5 Chen Hsin-Jen 5
#6 Chung Ming-Che 5
#7 Chung Ming Che 5
#8 Wen Shih Hao 4
#9 Tai Wei Jen 4
#10 Wu Yi-Sheng 3

Latest patents

Publication Filing date Title
TWI716262B Resin composition, cured film and black matrix
CN111435220A Photosensitive resin composition, optical film and method for producing same
TW202028368A Photosensitive resin composition, optical film, and method of producing the same
TWI691521B Flexible encapsulating material, process for preparing the same and encapsulating method using the same
CN111286291A Flexible packaging material, preparation method thereof and packaging method using material
TWI678596B Positive photoresist composition and method of forming patterned polyimide layer
CN110895382A Positive photoresist composition and method for forming patterned polyimide layer
TWI667537B Photosensitive resin composition and patterning method using the same
TWI662069B Photosensitive composition, color filter and method for preparing the color filter
TW201946958A Positive photosensitive composition and wafer dicing method using the same
TWI662063B Photosensitive polyimide composition and photoresist film made thereof
TWI621703B Conductive polymer composition solution and antistatic film and panel display thereof
CN106811009A Conductive polymer composites solution and its antistatic film and flat-panel screens
TWI559080B Photosensitive insulating resin composition and method of producing insulating film thereof
TWI553410B Composition, infrared ray transmitting filter and fabricating method thereof, and infrared ray sensor
US2015047881A1 Masking layer formed by applying developable photosensitive resin compositions on panel structure
CN104252100A Photosensitive hardening composition and application thereof
TW201500479A Photosensitive hardening composition
CN102621811A Developable photosensitive resin composition for panel structures
TW201232165A A developerizable photosensitive resin composition for use in a panel structure