| # | Country | Total Patents | |
|---|---|---|---|
| #1 | WIPO (World Intellectual Property Organization) | 4 | |
| #2 | EPO (European Patent Office) | 3 | |
| #3 | Israel | 3 | |
| #4 | United States | 3 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Optics | |
| #3 | Surface technology and coating |
| # | Technology | |
|---|---|---|
| #1 | Semiconductor devices | |
| #2 | Coating metallic material | |
| #3 | Photomechanical semiconductor production |
| # | Name | Total Patents |
|---|---|---|
| #1 | Goldstein Avery N | 10 |
| Publication | Filing date | Title |
|---|---|---|
| US5670279A | Lithography exposure mask derived from nanocrystal precursors and a method of manufacturing the same | |
| WO9526042A1 | Thin film electronic devices and manufacturing method | |
| US5576248A | Group IV semiconductor thin films formed at low temperature using nanocrystal precursors | |
| US5491114A | Method of making large-area semiconductor thin films formed at low temperature using nanocrystal presursors |