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SEMICONDUCTOR LEADING EDGE TEC

Overview
  • Total Patents
    809
About

SEMICONDUCTOR LEADING EDGE TEC has a total of 809 patent applications. Its first patent ever was published in 1998. It filed its patents most often in Japan, Republic of Korea and United States. Its main competitors in its focus markets semiconductors, optics and electrical machinery and energy are CSMC TECHNOLOGIES CORP, PROCESS LAB MICRON CO LTD and BEIJING ZHONGKE FEIHONG SCIENCE & TECHNOLOGY CO LTD.

Patent filings per year

Chart showing SEMICONDUCTOR LEADING EDGE TECs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Tokunaga Kenji 26
#2 Ogawa Shinichi 21
#3 Misawa Kaori 19
#4 Okamura Hiroshi 17
#5 Matsumoto Isao 16
#6 Furuya Akira 15
#7 Sone Shuji 15
#8 Kitajima Hiroshi 15
#9 Inukai Kazuaki 14
#10 Kanda Yasukatsu 14

Latest patents

Publication Filing date Title
JP2006222230A Proximity effect correction method
JP2006216598A Mask for charged particle beam exposure and mask inspection method
JP2006186152A Method of generating drawing data for electron beam lithography apparatus
TW200527485A Multilayered wiring structure, method of forming buried wiring, semiconductor device, method of manufacturing semiconductor device, semiconductor mounted device, and method of manufacturing semiconductor mounted device
JP2005210076A Deposition method of silicon nitride film, and manufacturing method of semiconductor device using the deposition method
JP2006139170A Method for modifying photomask using atomic force microscope
US2005082605A1 Semiconductor device and method for manufacturing semiconductor device
TW200512926A Method of manufacturing semiconductor device
JP2005117026A Method of manufacturing semiconductor device
JP2006041337A Methods for manufacturing silicon nitride film and semiconductor device
JP2006030489A Mask for inspection of foreign matter defect and method for manufacturing the same
JP2005020015A Mask
JP2005101529A Manufacturing method for semiconductor device, and semiconductor device
JP2006003527A Positive resist and pattern forming method using the same
JP2006003525A Pattern forming method
JP2005353999A Semiconductor device and its manufacturing method
JP2005033191A Method for manufacturing semiconductor device
JP2005353797A Semiconductor substrate and method for exposure by charged-particle beam
JP2005345920A Phase shift mask and its manufacturing method
JP2005340574A Semiconductor substrate and method of electrically charged particle line exposure