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Tailoring of linewidth through electron beam post exposure
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Electron beam annealing of metals, alloys, nitrides and silicides
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Method for controlling dopant profiles and dopant activation by electron beam processing
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Method for curing spin-on dielectric films utilizing electron beam radiation
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Electron beam modification of perhydrosilazane spin-on glass
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Enhancement of photoresist plasma etch resistance via electron beam surface cure
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Uniformity correction for large area electron source
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Electron beam treatment of fluorinated silicate glass
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Method of processing films prior to chemical vapor deposition using electron beam processing
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Modification of 193 nm sensitive photoresist materials by electron beam exposure
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Electrostatic chuck having replaceable dielectric cover
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Method of creating controlled discontinuity between photoresist and substrate for improving metal lift off
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Electron beam process during dual damascene processing
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Method of creating optimal photoresist structures used in the manufacture of metal T-gates for high-speed semiconductor devices
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Method for three-dimensional control of solubility properties of resist layers
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Large-area uniform electron source
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