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ELECTRON VISION CORP

Overview
  • Total Patents
    38
About

ELECTRON VISION CORP has a total of 38 patent applications. Its first patent ever was published in 1988. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Australia. Its main competitors in its focus markets semiconductors, optics and machines are SEMICONDUCTOR LEADING EDGE TEC, STARFIRE ELECTRONIC DEV & MARK and XIA TAI XIN SEMICONDUCTOR QING DAO LTD.

Patent filings per year

Chart showing ELECTRON VISION CORPs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Livesay William R 18
#2 Ross Matthew F 14
#3 Ross Matthew 13
#4 Wong Selmer 10
#5 Rubiales Anthony L 6
#6 Thompson Heike 5
#7 Rose David M 3
#8 Minter Jason P 2
#9 Marlowe Trey 2
#10 Yang Jingjun 2

Latest patents

Publication Filing date Title
US6340556B1 Tailoring of linewidth through electron beam post exposure
US6551926B1 Electron beam annealing of metals, alloys, nitrides and silicides
US6489225B1 Method for controlling dopant profiles and dopant activation by electron beam processing
US6607991B1 Method for curing spin-on dielectric films utilizing electron beam radiation
US6426127B1 Electron beam modification of perhydrosilazane spin-on glass
US6358670B1 Enhancement of photoresist plasma etch resistance via electron beam surface cure
US6407399B1 Uniformity correction for large area electron source
US6271146B1 Electron beam treatment of fluorinated silicate glass
US6204201B1 Method of processing films prior to chemical vapor deposition using electron beam processing
US6319655B1 Modification of 193 nm sensitive photoresist materials by electron beam exposure
US6195246B1 Electrostatic chuck having replaceable dielectric cover
US6218090B1 Method of creating controlled discontinuity between photoresist and substrate for improving metal lift off
US6207555B1 Electron beam process during dual damascene processing
US6255035B1 Method of creating optimal photoresist structures used in the manufacture of metal T-gates for high-speed semiconductor devices
US5468595A Method for three-dimensional control of solubility properties of resist layers
US5003178A Large-area uniform electron source